Wafer cleaning machine for 4-12 inch silicon

wafer cleaning machine for precision cleaning of 4-12 inch silicon wafer

Equipment Introduction:
Through the high-precision multi-axis manipulator, the product is taken out from the magazine and placed in the cleaning chamber with high cleanliness. Through the double cooperation of two fluid sprays up and down and high-speed centrifugal dehydration, the dust cleaning process on the surface of the product is completed.

Equipment Application and Industry:
It is applicable to chip, optical glass LENS, VCM, LENS and IR surface dust cleaning process in CCM camera module process.

Equipment Advantages:
1.High efficiency,UPH≥68 plates/hour
UPH≥102 plates/hour
2.High yield,yield≥ 99.3%
3.Compatibility,compatible with a variety of carriers
4.High market share in the domestic market, the stability and efficiency of the equipment has been recognized by customers, market share ranking top

The main products of ROC: SMT Cleaning Machine, PSA oxygen / nitrogen generator, wafer cleaning equipment, PCBA Cleaning Machine, PCB Separator, SMT Spare Parts, Reflow / Wave Soldering Machine, SMT Nozzle, SMT Feeder etc. If there is any need, please contact us.